𝔖 Bobbio Scriptorium

✦ LIBER ✦

394. Application of ion implantation for preparation of contacts metal-semiconductor: W Rosinski, Proc Int Work Conf on Ion Implant in Semicon, Rossendorf 1972, 201–204 (in Russian).

Publisher: Elsevier Science
Year: 1974
Tongue: English
Weight: 155 KB
Volume: 24
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(74)91908-3

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