## Abstract The gate characteristics (__I__~__D__~โ__V__~__GS__~) of fully depleted, lightly doped, enhanced SOI __n__โMOSFET are simulated over a wide range of operating temperature (300โ600 K) by using the SILVACO TCAD tools. Simulation results show that there exists a biasing point where the dra
โฆ LIBER โฆ
Zero-temperature-coefficient biasing point of partially depleted SOI MOSFET's
โ Scribed by Osman, A.A.; Osman, M.A.; Dogan, N.S.; Imam, M.A.
- Book ID
- 114536169
- Publisher
- IEEE
- Year
- 1995
- Tongue
- English
- Weight
- 277 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0018-9383
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