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Yttrium-induced structural changes in sputtered Ti1−xAlxN thin films

✍ Scribed by M. Moser; P.H. Mayrhofer


Book ID
113896738
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
391 KB
Volume
57
Category
Article
ISSN
1359-6462

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Standard θ-2θ and pole figure X-ray diffraction techniques were used to study structural properties and preferred orientation of nanostructured TiAlN thin films prepared using cathodic arc deposition. Systematic collection of reflections from lattice planes {111}, {200}, {220}, and {311} showed that