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Narrow resonance profiling study of the oxidation of reactively sputtered Ti1−xAlxN thin films

✍ Scribed by M.C Hugon; J.M Desvignes; B Agius; I.C Vickridge; D.J Kim; A.I Kingon


Book ID
114171976
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
153 KB
Volume
161-163
Category
Article
ISSN
0168-583X

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✍ Esaka, F.; Furuya, K.; Shimada, H.; Imamura, M.; Matsubayashi, N.; Kikuchi, T.; 📂 Article 📅 1999 🏛 John Wiley and Sons 🌐 English ⚖ 414 KB 👁 1 views

The difference in the initial oxidation behaviours of Ti 1-x Al x N (x = 0.20, 0.45, 0.65) films was studied by x-ray absorption (XAS) and by x-ray photoelectron spectroscopy (XPS) using synchrotron radiation (SR-XPS). The N K-edge XAS results indicated rapid decreases in the relative ratio of Al-N