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X-ray reflectometry and x-ray fluorescence monitoring of the atomic layer deposition process for high-k gate dielectrics

✍ Scribed by Hung, P. Y.; Gondran, Carolyn; Ghatak-Roy, Amiya; Terada, Shinichi; Bunday, Ben; Yeung, Henry; Diebold, Alain

Book ID: 126851091
Publisher: AVS (American Vacuum Society)
Year: 2005
Tongue: English
Weight: 643 KB
Volume: 23
Category: Article
ISSN: 0734-211X
DOI: 10.1116/1.2009774

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