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Characterization of high-k gate dielectric and metal gate electrode semiconductor samples with a total reflection X-ray fluorescence spectrometer

✍ Scribed by Chris M. Sparks; Meredith R. Beebe; Joe Bennett; Brendan Foran; Carolyn Gondran; Alex Hou


Book ID
108261509
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
443 KB
Volume
59
Category
Article
ISSN
0584-8547

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