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X-ray reflection, a technique for measuring sputtering yields of thin films

โœ Scribed by J. Verhoeven; A. Keppel; R. Schlatmann; Y. Xue; I.V. Katardjiev


Book ID
113285464
Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
760 KB
Volume
94
Category
Article
ISSN
0168-583X

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