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X-ray photoelectron spectroscopic characterization of molybdenum nitride thin films

✍ Scribed by Jeong-Gil Choi

Book ID
107514762
Publisher
Springer US
Year
2011
Tongue
English
Weight
680 KB
Volume
28
Category
Article
ISSN
0256-1115

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## Abstract Surface oxidation reactions of cobalt, molybdenum and mixed cobalt–molybdenum metals have been investigated using x‐ray photoelectron spectroscopy (XPS). The oxide stoichiometries have been determined from XPS intensity measurements. Such quantification has been important in identifying

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Aluminium nitride thin Ðlms grown at room temperature on degenerate silicon (conducting) substrates have been studied using XPS. The hydrolysis layer at the surface of the AlN was examined using valence band measurements, and the e †ect of 5 kV argon ion milling used to remove the hydrolysis layer w