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X-ray-diffraction study of crystalline Si nanocluster formation in annealed silicon-rich silicon oxides

✍ Scribed by Comedi, D.; Zalloum, O. H. Y.; Irving, E. A.; Wojcik, J.; Roschuk, T.; Flynn, M. J.; Mascher, P.


Book ID
120424213
Publisher
American Institute of Physics
Year
2006
Tongue
English
Weight
393 KB
Volume
99
Category
Article
ISSN
0021-8979

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## Abstract The results of a study of oxide precipitates in Czochralski (CZ) grown silicon using two X‐ray diffraction methods are reported. The diffuse scattering around the Bragg diffraction maxima was measured on a series of samples after various two‐stage annealing treatment. Combining the anal