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Void formation during thermal decomposition of ultrathin oxide layers on the Si(110) surface

✍ Scribed by Ken Fujita; Heiji Watanabe; Masakazu Ichikawa

Book ID: 117219160
Publisher: Elsevier Science
Year: 1998
Tongue: English
Weight: 724 KB
Volume: 398
Category: Article
ISSN: 0039-6028
DOI: 10.1016/s0039-6028(98)80018-6

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