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Viscoelastic Relaxation and Sputter-depth Profiling of Amorphous Materials

✍ Scribed by Carter, G.

Publisher
John Wiley and Sons
Year
1997
Tongue
English
Weight
206 KB
Volume
25
Category
Article
ISSN
0142-2421

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✦ Synopsis

The e †ects of viscoelastic relaxation processes on apparent depth shifts and broadening of marker species during sputter-depth proÐling of composition in amorphous substrates is evaluated by approximate analysis of the composition balance equations developed for such systems. It is shown that for materials where ion bombardment reduces viscosity the substrates can be regarded as purely elastic, but for systems where radiation increases viscosity small depth shifts and a reduction in broadening can occur for shallow markers.

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We analytically derive the relaxation spectra of a two-phase isotropic material whose phases are isotropic Maxwell media, according to the classical and to the generalized self-consistent schemes. Whereas these spectra are continuous in both cases, they exhibit strong differences which can be associ