Very low temperature polycrystalline silicon films with very large grains deposited for thin film transistor applications

✍ Scribed by K.C. Wang; T.R. Yew; H.L. Hwang

• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 311 KB
• Volume: 92
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/0169-4332(95)00210-3