Very high electron mobility In0.8Ga0.2As heterostructure grown by molecular beam epitaxy
β Scribed by Munecazu Tacano; Yoshinobu Sugiyama; Yukihiro Takeuchi; Yoshiki Ueno
- Book ID
- 112975543
- Publisher
- Springer US
- Year
- 1991
- Tongue
- English
- Weight
- 394 KB
- Volume
- 20
- Category
- Article
- ISSN
- 0361-5235
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Deep hole traps in Be doped p-type Al 0.2 Ga 0.8 As grown by molecular beam epitaxy have been studied by the deeplevel transient-spectroscopy method applied to samples with a Schottky diode configuration. Six hole traps, labeled as H1-H6, were found. Activation energies and capture cross sections ha
In 0.48 Ga 0.52 P/In 0.20 Ga 0.80 As/GaAs pseudomorphic high electron mobility transistor (p-HEMT) structures were grown by solid-source molecular beam epitaxy (SSMBE) using a valved phosphorus cracker cell. The electron mobility and sheet carrier density at room temperature were 1700 cm 2 /Vs and 3