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Variation of residual stress in cubic boron nitride film caused by hydrogen addition during unbalanced magnetron sputtering

✍ Scribed by H.-S. Kim; J.-K. Park; W.-S. Lee; Y.-J. Baik

Book ID: 113937138
Publisher: Elsevier Science
Year: 2011
Tongue: English
Weight: 754 KB
Volume: 519
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2011.06.092

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