The parameter space of hydrogen content added to Ar–nitrogen sputtering gas and substrate bias voltage for the formation of cubic boron nitride thin film deposited by unbalanced magnetron sputtering method

✍ Scribed by Ko, J.-S.; Park, J.-K.; Lee, W.-S.; Baik, Y.-J.

• Book ID: 121215715
• Publisher: Elsevier Science
• Year: 2013
• Tongue: English
• Weight: 401 KB
• Volume: 223
• Category: Article
• ISSN: 0257-8972
• DOI: 10.1016/j.surfcoat.2013.02.032