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Variable-energy positron beam study of arsenic diffusion in poly-silicon

✍ Scribed by D.W. Lawther; R. Khatri; P.J. Simpson; P.J. Schultz; I. Calder; L. Weaver


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
431 KB
Volume
85
Category
Article
ISSN
0169-4332

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Mixtures of hexamethyldisiloxane [HMDSiO, (CH 3 ) 3 SiOSi(CH 3 ) 3 ] and oxygen are plasma polymerized at different oxygen pressures (P O 2 Ο­ 1.3-11.4 Pa) and a fixed monomer pressure (P m Ο­ 2.6 Pa). The discharge power is kept at 100 W throughout the work. Nanometer-size holes in the deposited film