๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Using Mather-Type Plasma Focus Device for Fabrication of Tungsten Thin Films

โœ Scribed by Hosseinnejad, M. T.; Shirazi, M.; Ghorannevis, Z.; Ghoranneviss, M.; Shahgoli, F.

Book ID
118802306
Publisher
Springer
Year
2011
Tongue
English
Weight
458 KB
Volume
31
Category
Article
ISSN
0164-0313

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Fabrication of the ZnO thin films using
Fabrication of the ZnO thin films using wet-chemical etching processes on application for organic light emitting diode (OLED) devices
โœ D.-G. Yoo; S.-H. Nam; M.H. Kim; S.H. Jeong; H.-G. Jee; H.J. Lee; N.-E. Lee; B.Y. ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 850 KB

We deposited ZnO thin films at room temperature by RF magnetron sputtering method with home-made targets, and for application tests using these films as transparent conductive oxide (TCO) anodes, wetchemical etching behaviors of ZnO films were also investigated using various chemicals. In order to f