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Structural and Morphological Investigations of Deposited Tungsten Nitride Thin Films Using Plasma Focus Device

โœ Scribed by M. T. Hosseinnejad; G. R. Etaati; M. Ghoranneviss; M. shirazi; Z. Ghorannevis


Book ID
106412100
Publisher
Springer
Year
2011
Tongue
English
Weight
487 KB
Volume
30
Category
Article
ISSN
0164-0313

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Deposition of tungsten nitride on stainl
โœ G.R. Etaati; M.T. Hosseinnejad; M. Ghoranneviss; M. Habibi; M. shirazi ๐Ÿ“‚ Article ๐Ÿ“… 2011 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 814 KB

Tungsten nitride (WN) films were deposited on the stainless steel-304 substrate by a 2 kJ Mather-type plasma focus device. The preparation method and characterization data are presented. X-ray diffractometer (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM) were employed fo