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Unlocking the potential of voltage control for high rate zirconium and hafnium oxide deposition by reactive magnetron sputtering

✍ Scribed by Audronis, Martynas; Matthews, Allan; Juškevičius, Kęstutis; Drazdys, Ramutis

Book ID: 121938069
Publisher: Elsevier Science
Year: 2014
Tongue: English
Weight: 759 KB
Volume: 107
Category: Article
ISSN: 0042-207X
DOI: 10.1016/j.vacuum.2014.04.025

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