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Ultrathin SiO 2 layers on Si(111): preparation, interface gap states and the influence of passivation

✍ Scribed by Stegemann, Bert; Sixtensson, Daniel; Lußky, Thomas; Schoepke, Andreas; Didschuns, Iris; Rech, Bernd; Schmidt, Manfred

No coin nor oath required. For personal study only.

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