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Effect of wet-chemical substrate smoothing on passivation of ultrathin-SiO2/n-Si(111) interfaces prepared with atomic oxygen at thermal impact energies

✍ Scribed by Angermann, Heike ;Gref, Orman ;Stegemann, Bert


Book ID
111489332
Publisher
Walter de Gruyter GmbH
Year
2011
Tongue
English
Weight
968 KB
Volume
9
Category
Article
ISSN
2391-5471

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