๐”– Bobbio Scriptorium
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Ultrafast deep UV lithography using excimer lasers

โœ Scribed by K. Jain; S. Rice; B. J. Lin


Publisher
Society for Plastic Engineers
Year
1983
Tongue
English
Weight
264 KB
Volume
23
Category
Article
ISSN
0032-3888

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200nm Deep-UV lithography using Step-and
โœ Harry Sewell ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 487 KB

This paper reports the performance of deep-UV resists on a new high-NA Step-and-Scan system. The study highlights the requirements for the printing of 200nm lithography using single-layer resists. Results are reported for resist systems such as TOK, APEX and ARCH2. SEM profiles are used to demonstra