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Ultra-Thin Si1−xGexDislocation Blocking Layers for Ge/Strained Si CMOS Devices

✍ Scribed by Sachin Joshi; Sagnik Dey; Michelle Chaumont; Alan Campion; Sanjay K. Banerjee

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Study of ultra-thin Ge/Si strained layer

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Carrier transport parameters for devices

✍ T. Manku; A. Nathan 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 354 KB

Dislocation structures and strain-relaxa

✍ Takeo Yamamoto; Akira Sakai; Tomohiro Egawa; Noriyuki Taoka; Osamu Nakatsuka; Sh 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 378 KB

A simple expression for band gap narrowi

📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 133 KB

ECS Transactions [ECS Semiconductor Tech

✍ Ma, T. P.; Sun, Xiao 📂 Article 📅 2011 🏛 ECS ⚖ 555 KB

Epitaxial lattice matching between epi-n

✍ K. Ramamoorthy; C. Sanjeeviraja; M. Jayachandran; K. Sankaranarayanan; Pankaj Mi 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 221 KB