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Ultra-Shallow Thermal Donor Formation in Oxygen-Containing Ambient

✍ Scribed by D. Åberg; T. Hallberg; B.G. Svensson; J.L. Lindström; M.K. Linnarsson

Publisher: John Wiley and Sons
Year: 1998
Tongue: English
Weight: 161 KB
Volume: 210
Category: Article
ISSN: 0370-1972
DOI: 10.1002/(sici)1521-3951(199812)210:2<527::aid-pssb527>3.0.co;2-l

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## Abstract The characteristic features of production processes of thermal donors in Czochralski grown silicon heat treated at __T__=450°C under hydrostatic pressures of about 1 GPa are studied. Two families of oxygen‐related donors are formed under compressive stress. The first one is the well‐kno