A conventional TEWSTEM has been used for the fabrication of -10 nm-size structures by electron-beam lithography. The electron microscope provides a versatile tool for studying the lithographic process with control of the beam energy, current, and profile combined with the ability to image both the p
✦ LIBER ✦
Ultra-high resolution measuring of beam momentum distributions
✍ Scribed by F. Hinterberger; P.v. Rossen; R. Jahn; B. Schüller
- Publisher
- Elsevier Science
- Year
- 1975
- Weight
- 625 KB
- Volume
- 130
- Category
- Article
- ISSN
- 0029-554X
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