AZO (Al: 2 wt %) films were deposited at 300 ΛC on fused silica substrates by the radio-frequency magnetron sputtering method under different sputtering pressures and at various sample positions in order to obtain the optimum sputtering condition for low-resistivity AZO films. It was found that the
β¦ LIBER β¦
Two-layer hybrid anti-reflection film prepared on the plastic substrates
β Scribed by Jin-Yeol Kim; Yang-Kyoo Han; Eung-Ryul Kim; Kwang-Suck Suh
- Publisher
- Elsevier Science
- Year
- 2002
- Tongue
- English
- Weight
- 178 KB
- Volume
- 2
- Category
- Article
- ISSN
- 1567-1739
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