Resistivity and Hall effect measurements were carried out as a function of magnetic field (0-1.5 T) and temperature (30-300 K) for Al 0.88 In 0.12 N/AlN/GaN/AlN heterostructures grown by Metal Organic Chemical Vapor Deposition (MOCVD). Magnetic field dependent Hall data were analyzed by using the qu
β¦ LIBER β¦
Two-dimensional electron gas properties by current-voltage analyses of Al0.86In0.14N/AlN/GaN heterostructures
β Scribed by Pandey, S.; Fraboni, B.; Cavalcoli, D.; Minj, A.; Cavallini, A.
- Book ID
- 120347894
- Publisher
- American Institute of Physics
- Year
- 2011
- Tongue
- English
- Weight
- 686 KB
- Volume
- 99
- Category
- Article
- ISSN
- 0003-6951
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