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Two-dimensional distributions of Xe ions implanted in Si3N4 films

✍ Scribed by Ke-Ming Wang; Zhong-Lie Wang; Bo-Rong Shi; Bao-Dong Qu; Xiang-Dong Liu; Ji-Tian Liu; Qing-Tai Zhao


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
403 KB
Volume
44
Category
Article
ISSN
0042-207X

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In view of the integration within Si-based optical devices, LPCVD (low-pressure chemical vapor deposition) thin-film Si 3 N 4 waveguides have been fabricated on a Si substrate within a CMOS fabrication pilot-line. Different structures (channel, rib and strip-loaded) were designed, fabricated and cha