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Tunneling in sub-5 nm La2O3 films deposited by E-beam evaporation

โœ Scribed by E. Miranda; J. Molina; Y. Kim; H. Iwai


Book ID
116668946
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
194 KB
Volume
352
Category
Article
ISSN
0022-3093

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Electrical properties of sub-100 nm
โœ A. Inberg; E. Glickman; T. Asher; N. Fishelson; Y. Shacham-Diamand ๐Ÿ“‚ Article ๐Ÿ“… 2009 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 589 KB

Self-assembled organic monolayers (SAMs) are good coupling agents and diffusion barriers at Cu/SiO 2 and Cu/ low-k interfaces and are considered therefore as important elements of future all-wet ULSI metallization with sub-45 nm Cu deposited by electroless plating (ELD). We formed SAM of 3-aminoprop