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Transient enhanced diffusion and defect microstructure in high dose, low energy As+ implanted Si

โœ Scribed by Krishnamoorthy, V.; Moller, K.; Jones, K. S.; Venables, D.; Jackson, J.; Rubin, L.


Book ID
111950596
Publisher
American Institute of Physics
Year
1998
Tongue
English
Weight
565 KB
Volume
84
Category
Article
ISSN
0021-8979

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