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TP-B5 integrated GaInAsP/InP lasers formed by reactive ion etching

โœ Scribed by Coldren, L.A.; Iga, K.; Miller, B.I.; Rentschler, J.A.


Book ID
114593618
Publisher
IEEE
Year
1980
Tongue
English
Weight
148 KB
Volume
27
Category
Article
ISSN
0018-9383

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Nanofabrication of GaInAsP/InP 2-dimensi
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As a 2-dimensional photonic crystal, columns periodically arranged with nanometer order pitches have been formed on GalnAsP/InP wafer, aiming at the effective control of spontaneous emission without discrimination of nonradiative process. For the fine and low damage etching of columns, a reactive io