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Titanium silicide formation: Effect of oxygen distribution in the metal film

✍ Scribed by Berti, M.; Drigo, A. V.; Cohen, C.; Siejka, J.; Bentini, G. G.; Nipoti, R.; Guerri, S.


Book ID
120934485
Publisher
American Institute of Physics
Year
1984
Tongue
English
Weight
875 KB
Volume
55
Category
Article
ISSN
0021-8979

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