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Titanium-dioxide film formation using gas cluster ion beam assisted deposition technique

โœ Scribed by O. Nakatsu; J. Matsuo; K. Omoto; T. Seki; G. Takaoka; I. Yamada


Book ID
114167211
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
110 KB
Volume
206
Category
Article
ISSN
0168-583X

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Fluoride thin film formation with low op
โœ S. Nakazawa; N. Toyoda; K. Mochiji; T. Mitamura; I. Yamada ๐Ÿ“‚ Article ๐Ÿ“… 2007 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 491 KB

Gas cluster ion beam (GCIB) shows characteristics of low-energy irradiation effect and dense energy deposition. GCIB-assisted deposition is expected to be used for high-quality fluoride film formation, although these films are sensitive to damage by ion irradiation. In this study, LaF 3 and MgF 2 fi