The paper presents the results obtained on the deposition and characterization of niobium carbide thin films obtained by reactive magnetron sputtering method in a reactive atmosphere composed by Ar and CH 4 . The coatings were deposited on Si substrates, at 100 °C, 400 °C and 750 °C, at two differen
TiAlOn black decorative coatings deposited by magnetron sputtering
✍ Scribed by R. Luthier; F. Lévy
- Publisher
- Elsevier Science
- Year
- 1990
- Tongue
- English
- Weight
- 734 KB
- Volume
- 41
- Category
- Article
- ISSN
- 0042-207X
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