The paper presents the results obtained on the deposition and characterization of niobium carbide thin films obtained by reactive magnetron sputtering method in a reactive atmosphere composed by Ar and CH 4 . The coatings were deposited on Si substrates, at 100 Β°C, 400 Β°C and 750 Β°C, at two differen
β¦ LIBER β¦
Characterization of nitride coatings on high density graphite deposited by magnetron sputtering
β Scribed by A. Ravi Shankar; B. Prabhakara Reddy; Vipin Chawla; M. Jeya Preyanga; Ramesh Chandra; U. Kamachi Mudali
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 825 KB
- Volume
- 204
- Category
- Article
- ISSN
- 0257-8972
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