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Three-level charge pumping study of radiation-induced defects at SiSiO2 interface in submicrometer MOS transistors

✍ Scribed by Jean-Luc Autran; Bernard Balland; Daniel Babot


Book ID
115990363
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
381 KB
Volume
187
Category
Article
ISSN
0022-3093

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