Thin Film Processes II

✍ Scribed by Vossen, John L.; Kern, Werner(eds.)

• Publisher: Elsevier
• Year: 1991
• Tongue: English
• Leaves: 496
• Category: Library

✦ Synopsis

This book gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature.

✦ Table of Contents

Content:
Front Matter
• Preface
• Table of Contents
1. Introduction
2. Glow Discharge Plasmas and Sources for Etching and Deposition
3. Evaporation Processes
4. Molecular Beam Epitaxy
5. Sputter Deposition Processes
6. The Cathodic Arc Plasma Deposition of Thin Films
7. Thermal Chemical Vapor Deposition
8. OMVPE of Compound Semiconductors
9. Photochemical Vapor Deposition
10. Sol–Gel Coatings
11. Plasma-Enhanced Chemical Vapor Deposition
12. Formation of Inorganic Films by Remote Plasma-Enhanced Chemical-Vapor Deposition
13. Selected Area Processing
14. Plasma-Assisted Etching
15. Ion Beam Etching
16. Laser-Driven Etching
• Index