Thin Film Processes

✍ Scribed by John L. Vossen (Auth.)

• Publisher: Academic Press
• Year: 1978
• Tongue: English
• Leaves: 553
• Category: Library

✦ Synopsis

Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process

✦ Table of Contents

Content:
Front Matter, Page iii
Copyright, Page iv
List of Contributors, Pages ix-x
Preface, Page xi
I-1 - Introduction, Pages 3-7
II-1 - Glow Discharge Sputter Deposition, Pages 11-73
II-2 - Cylindrical Magnetron Sputtering, Pages 75-113
II-3 - The Sputter and S-Gun Magnetrons, Pages 115-129
II-4 - Planar Magnetron Sputtering, Pages 131-173
II-5 - Ion Beam Deposition, Pages 175-206
III-1 - Deposition of Inorganic Films from Solution, Pages 209-256
III-2 - Chemical Vapor Deposition of Inorganic Thin Films, Pages 257-331
IV-1 - Plasma Deposition of Inorganic Thin Films, Pages 335-360
IV-2 - Glow Discharge Polymerization, Pages 361-398
V-1 - Chemical Etching, Pages 401-496
V-2 - Plasma-Assisted Etching Techniques for Pattern Delineation, Pages 497-556
Index, Pages 557-564