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Thin film microelectronics: the preparation and properties of components and circuit arrays


Publisher
Elsevier Science
Year
1966
Tongue
English
Weight
183 KB
Volume
16
Category
Article
ISSN
0042-207X

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๐Ÿ“œ SIMILAR VOLUMES


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Boron thin films were prepared by plasma assisted chemical vapor deposition. The source gas was boron trichloride (BCl 3 ). Ring patterns of transmission electron beam diffraction indicated that films were polycrystalline -rhombohedral boron. Optical absorption edge was estimated from absorption spe

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Boron thin 5lms were deposited by electron beam evaporation and by pyrolysis of decaborane on quartz substrates. Re6ection electron beam di4raction was used to characterize the crystal structure. The amorphous structure was observed for the 5lm deposited by electron beam evaporation. The 5lm was pol