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Thickness uniformity of silicon-on-insulator fabricated by plasma immersion ion implantation and ion cut

โœ Scribed by Fan, Z.; Chu, P.K.; Cheung, N.W.; Chan, C.


Book ID
114558751
Publisher
IEEE
Year
1999
Tongue
English
Weight
101 KB
Volume
27
Category
Article
ISSN
0093-3813

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