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Instrumental and process considerations for the fabrication of silicon-on-insulators (SOI) structures by plasma immersion ion implantation

✍ Scribed by Chu, P.K.; Shu Qin; Chung Chan; Cheung, N.W.; Ko, P.K.

Book ID: 114558459
Publisher: IEEE
Year: 1998
Tongue: English
Weight: 160 KB
Volume: 26
Category: Article
ISSN: 0093-3813
DOI: 10.1109/27.659535

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