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Thickness uniformity and electrical properties of ultrathin gate oxides grown in N2O ambient by rapid thermal processing

โœ Scribed by Yoon, G. W.; Joshi, A. B.; Ahn, J.; Kwong, D. L.


Book ID
115481875
Publisher
American Institute of Physics
Year
1992
Tongue
English
Weight
749 KB
Volume
72
Category
Article
ISSN
0021-8979

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