Thickness scaling limitation factors of ONO interpoly dielectric for nonvolatile memory devices

✍ Scribed by Mori, S.; Araki, Y.Y.; Sato, M.; Meguro, H.; Tsunoda, H.; Kamiya, E.; Yoshikawa, K.; Arai, N.; Sakagami, E.

• Book ID: 114536347
• Publisher: IEEE
• Year: 1996
• Tongue: English
• Weight: 926 KB
• Volume: 43
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/16.477592