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Thickness dependence of microstructure and properties of ZnO thin films deposited by metal-organic chemical vapor deposition using ultrasonic nebulization

✍ Scribed by Lee, Choon-Ho; Kim, Do-Woo


Book ID
123218778
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
730 KB
Volume
546
Category
Article
ISSN
0040-6090

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## 2. Experimental procedures ZnO film was deposited on the SI-GaAs (100) substrate by MOCVD. Diethylzinc (DEZn) and O 2 were chosen as precursor of Zn and O, respectively, and high purity Ar was used as the carrying gas for DEZn. The mol flux ratio of Zn to O was kept at 1:250. The