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Thermal stability of RuO2 thin films prepared by modified atomic layer deposition

✍ Scribed by Kim, Jin-Hyock; Ahn, Ji-Hoon; Kang, Sang-Won; Roh, Jae-Sung; Kwon, Se-Hun; Kim, Ja-Yong

Book ID: 121368467
Publisher: Elsevier Science
Year: 2012
Tongue: English
Weight: 795 KB
Volume: 12
Category: Article
ISSN: 1567-1739
DOI: 10.1016/j.cap.2012.02.050

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