๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Thermal stability and gap-fill properties of spin-on MSQ low-k dielectrics

โœ Scribed by N. Ahner; S.E. Schulz; F. Blaschta; M. Rennau


Book ID
104051805
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
241 KB
Volume
84
Category
Article
ISSN
0167-9317

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Optical, electrical and structural prope
โœ N. Ahner; S.E. Schulz; F. Blaschta; M. Rennau ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 619 KB

Looking onto application of low-k and ultra low-k materials within FEOL, high temperature load is one of the major challenges. But also temperature ranges below standard curing conditions are of special interest, e.g. for integration of transparent low-k materials into optical devices due to their s

Deposition temperature effect on thermal
โœ N. Ariel; M. Eizenberg; Y. Wang; S.P. Murarka ๐Ÿ“‚ Article ๐Ÿ“… 2001 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 251 KB

Fluorinated amorphous carbon films (a-F : C) were deposited by high-density plasma-chemical vapor deposition (HDP-CVD) using C 4 F 8 and CH 4 as precursors. The deposition process was performed at two temperatures: $200 and $3508C. In order to study the thermal stability of the films, the samples we