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Thermal processing of GaAsSb/GaAs low-dimensional strained-layer structures

✍ Scribed by K.P. Homewood; W.P. Gillin; R.E. Pritchard; W.S. Truscott; K.E. Singer


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
283 KB
Volume
7
Category
Article
ISSN
0749-6036

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✦ Synopsis


Strained 100 A GaAsSb quantum wells in GaAs, grown by Molecular Beam Epitaxy have heen subjected to thermal anneals up to a temperature of 950 "C and for times varying from a few seconds to several minutes. The interdiffusion on the group V sublattice has been monitored using photo1 umineacence of the ground state &ions from the quantum well. We have made measumments on undoped and both p and n, Be and Si, doped structures. The intermixin g is observed to be strongly non-linear. Doping is found to reduce the interdiffusion.


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The transport properties of low-dimensional patterned semiconductors exhibit interesting phenomena. In this paper, we report on the preparation and electric characterization of mesoscopic GaAs nets which are obtained by Ar-ion etching with a polymer net as mask. The diameter of the meshes is about 1