Thermal processing of GaAsSb/GaAs low-dimensional strained-layer structures
β Scribed by K.P. Homewood; W.P. Gillin; R.E. Pritchard; W.S. Truscott; K.E. Singer
- Publisher
- Elsevier Science
- Year
- 1990
- Tongue
- English
- Weight
- 283 KB
- Volume
- 7
- Category
- Article
- ISSN
- 0749-6036
No coin nor oath required. For personal study only.
β¦ Synopsis
Strained 100 A GaAsSb quantum wells in GaAs, grown by Molecular Beam Epitaxy have heen subjected to thermal anneals up to a temperature of 950 "C and for times varying from a few seconds to several minutes. The interdiffusion on the group V sublattice has been monitored using photo1 umineacence of the ground state &ions from the quantum well. We have made measumments on undoped and both p and n, Be and Si, doped structures. The intermixin g is observed to be strongly non-linear. Doping is found to reduce the interdiffusion.
π SIMILAR VOLUMES
The transport properties of low-dimensional patterned semiconductors exhibit interesting phenomena. In this paper, we report on the preparation and electric characterization of mesoscopic GaAs nets which are obtained by Ar-ion etching with a polymer net as mask. The diameter of the meshes is about 1