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The substrate temperature dependent electrical properties of titanium dioxide thin films

โœ Scribed by A. Yildiz; S. B. Lisesivdin; M. Kasap; Diana Mardare

Publisher
Springer US
Year
2009
Tongue
English
Weight
446 KB
Volume
21
Category
Article
ISSN
0957-4522

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This paper addresses the effects of substrate temperature on electrical and structural properties of dc magnetron sputter-deposited copper (Cu) thin films on p-type silicon. Copper films of 80 and 500 nm were deposited from Cu target in argon ambient gas pressure of 3.6 mTorr at different substrate