This paper addresses the effects of substrate temperature on electrical and structural properties of dc magnetron sputter-deposited copper (Cu) thin films on p-type silicon. Copper films of 80 and 500 nm were deposited from Cu target in argon ambient gas pressure of 3.6 mTorr at different substrate
β¦ LIBER β¦
The effect of substrate temperature on the electrical properties of thin chromium films
β Scribed by M. A. Angadi; L. A. Udachan
- Publisher
- Springer
- Year
- 1981
- Tongue
- English
- Weight
- 269 KB
- Volume
- 16
- Category
- Article
- ISSN
- 0022-2461
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