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The Si—C Bond Distance in Si(CH 3 ) 4

✍ Scribed by Sheehan, W. F.; Schomaker, Verner


Book ID
121383487
Publisher
American Chemical Society
Year
1952
Tongue
English
Weight
138 KB
Volume
74
Category
Article
ISSN
0002-7863

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Ion chemistry in tetramethylsilane (CH3)
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The cross sections for simple and dissociative ionization of tetramethylsilane ((CHa)4Si or TMS) by electron impact have been measured using Fourier-transform mass spectrometry. The total ionization cross section is 8.5 × 10-~6 cm 2 between 30 and 70 eV. The molecular ion is Jahn-Teller unstable, wi